Strasbaugh CMP tool pad cleaning system:

Replaces your DI water rinse of table # 1 with a pressurized Di water rinse.

· Helps reduce wafer scratches by cleaning your pad from dried up slurry and

Pad conditioner diamond flakes.

· Fully integrated into the CMP tool.

· Adjustable DIW , and CDA flow rates.

· Will not void your warranty of the CMP tool.

· Clean room compatible.