Strasbaugh CMP tool pad cleaning system:
Replaces your DI water rinse of table # 1 with a pressurized Di water rinse.
· Helps reduce wafer scratches by cleaning your pad from dried up slurry and
Pad conditioner diamond flakes.
· Fully integrated into the CMP tool.
· Adjustable DIW , and CDA flow rates.
· Will not void your warranty of the CMP tool.
· Clean room compatible.