DNS SP-813 wafer cleaner torque monitoring system:

This system monitors the brush pressure exerted on the wafer for spin#2.

· Reduce scrap wafers.

· Prevent the operators from running the tool with a used up brush.

· Data collection and plot graphs for every wafer run with time stamp.

· Log file for events including brush changes.

· Pass/fail with Low and High torque limits.

· Alarm and stop the DNS tool from running on torque alarm and brush life cycle time.

· PC based with touch screen.

· Multiple installation in the field, running 24/7 for the past 8 years.

· Will not void your warranty of DNS tool.

· Clean room Compatible.