DNS SP-813 wafer cleaner torque monitoring system:
This system monitors the brush pressure exerted on the wafer for spin#2.
· Reduce scrap wafers.
· Prevent the operators from running the tool with a used up brush.
· Data collection and plot graphs for every wafer run with time stamp.
· Log file for events including brush changes.
· Pass/fail with Low and High torque limits.
· Alarm and stop the DNS tool from running on torque alarm and brush life cycle time.
· PC based with touch screen.
· Multiple installation in the field, running 24/7 for the past 8 years.
· Will not void your warranty of DNS tool.
· Clean room Compatible.